High-intensity ion beams with submillisecond duration for synergistic of ion implantation and energy impact on the surface

Abstract

The development of methods to modify materials based on the synergistic high-intensity implantation and simultaneous energy impact on the ion-doped layer involves using the pulsed and repetitively-pulsed beams of metal and gas ion beams with micro-submillisecond duration with high pulsed power density. The paper presents the results of experimental studies on the formation of pulsed and repetitively-pulsed high-intensity beams of titanium ions with a pulse duration from 150 to 500 μs. The plasma flow was generated by a vacuum arc discharge. To obtain ion beams with a power density in the range from several tens to several hundreds of kilowatts per square centimeter, ballistic focusing of ions was used using an extracting grid electrode in the form of a part of a sphere. The features of the forming the high-power repetitively-pulsed beams of titanium ions were studied using both the ion source “Rainbow 5”. Data are presented on the influence of the ion beam space charge neutralization processes at current densities from fractions to several amperes per square centimeter on the efficiency of the ion beam’s transport and focusing at accelerating voltages from 10 to 30 kV.