Techniques for Thin Films of Advanced Materials

Abstract

With the advent of nanoscience and nanotechnology, there has been an upsurge in the synthesis, characterization, and application of numerous functional materials. This has been attributed predominantly to the enhanced surface area to volume ratio and ease of control over the surface functionalities requisite for targeted applications. The numerous functionalities and tailor made properties are obtained by careful choice of process parameters involved in different synthesis strategies. Thin film deposition techniques have become the obvious choice of synthesis as it is possible to envisage the desired control in the resulting advanced materials. In order to introduce the novel functionalities in these advanced materials, the thin film deposition techniques have been modulated, upgraded, and even developed. The present chapter focuses on the recent advancement in the thin film techniques that have been utilized effectively to realize advanced materials for targeted applications. Each technique has been discussed elaborately explaining the basic principle and importantly highlighting the novel functionalities introduced, its merits and demerits citing advanced materials synthesized using the same.KeywordsThin filmsAdvanced materialsMetal oxide semiconductorNanoscienceNanotechnology