Techniques for epitaxial site-selective growth of quantum dots

Abstract

We present an overview of techniques used to pattern the epitaxial growth of quantum dots. Subsequent growth, morphology, and optical characterization are also discussed. The guided assembly of epitaxially grown quantum dots is a research area of great interest in order to enable their use for scalable device applications. The techniques discussed in this review include methods of fabrication and growth, stressor layer growth, alternate materials, theoretical modeling, and device integration.