Abstract
In order to decrease the dispersion of the silicon vertical slot waveguide, we propose a multilayered hybrid silicon vertical waveguide structure. This multilayered waveguide is formed by three low-refractive-index regions interleaved with two narrow silicon rails. Simulation shows that the optical field in the central low-index region is enhanced. After optimization, the dispersion of the waveguide can be limited within ±300 ps/nm/km from 1450 to 1950 nm. This multilayered waveguide has potential in on-chip nonlinear optical applications, such as in all-optical signal processing.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
