Abstract
Titanium dioxide (TiO2) thin films are deposited onto glass and silicon <100> substrates by high power impulse magnetron sputtering (HiPIMS) at various substrate positions from the substrate-holder center (x = 0, 10, 20 and 30 mm). The structural analysis conducted through XRD and Raman spectroscopy shows that all the films deposited at lower radial distance (x = 0–20 mm) are identified as pure anatase phase of TiO2, while those deposited at 30 mm contain a small trace of rutile phase with anatase phase remaining dominant. AFM analysis reveals homogenous surfaces with low values of roughness (2.6–3.8 nm) and a decrease of grain size with the substrate position. The films exhibit high refractive index and large indirect optical band gaps (3.25–3.38 eV). Finally, UV-blocking and antireflection characteristics are studied.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
