Abstract
The paper presents a system which comprises a gas plasma source and an ion source and allows surface treatment of dielectrics due to ion charge compensation by plasma electrons. The ion energy corresponds to the discharge voltage of the ion source. The hardness of a-C:H coatings deposited by the method is up to 40–45 GPa.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have