Abstract
The structure and electrical and optical properties of heterostructures formed on the surface of single-crystal silicon wafers as a result of the heat treatment and pulsed photon treatment of Ti films in oxygen, air, and nitrogen are investigated. It is shown that a TiO2/Ti5Si3/p-Si heterostructure is formed upon heat treatment in air, whereas a TiO2/TiSi2/p-Si heterostructure is formed upon photon treatment. It is established that rutile films with pronounced n-type conductivity are formed as a result of the heat treatment of Ni-doped Ti films in oxygen. Rutile films with p-type conductivity are formed upon the thermal annealing of Ti films in air with subsequent photon treatment in nitrogen.
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