Abstract

We study the effect of substrate type, source temperature, and substrate position on the morphology of Alfa molybdenum oxide (α-MoO3) in physical vapour deposition. We found that the orientation and thickness of the MoO3 is strongly affected by the evaporated flow and temperature. Lying down, few layered (FL) MoO3 can be grown directly on technical substrate such as SiO2 with typical length scale of tens of micrometres. Our studies provide a simple, catalyst-free and low cost synthesis way to prepared large size FL MoO3 for further optical and electrical investigation such as photodetector, field effect transistors, and electrochromism.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.