Abstract
AbstractA new series of tungsten complexes were prepared using WCl6, N‐tert‐butyltrimethylsilylamine, and amide ligands as potential precursors for WNx thin film deposition. The complexes [W(NtBu)(NMe2)4] (2), [W(NtBu)(MeNCH2CH2NMe)2] (3), [W(NtBu)(MeNCH2CH2CH2NMe)2] (4), [W(NtBu)(iPrNCH2CH2NiPr)2] (5), and [W(NtBu)(tBuNCH2CH2NtBu)2] (6) were prepared by a two‐step process. First, the controlled reaction between WCl6 and N‐tert‐butyltrimethylsilylamine afforded the complex [W(NtBu)Cl4(py)] (1) from which the substitution of chloride ions with the corresponding amide ligands gave complexes 2–6. Single crystal X‐ray crystallography showed that complex 1 crystalized in the triclinic space group P‐1 with an octahedral structure. Among complexes 2–6, complexes 4 and 5 exhibited good volatility and stability.
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