Abstract
Boron nitride films with carbon added (BN:C) were deposited on Si (1 0 0) substrates by a dual-ion beam sputtering deposition method. The BN:C films were analyzed by electron spectroscopy for chemical analysis and a Fourier transform infrared spectroscopy. In addition, a nano-indentation method was used to measure the hardness of the films. Internal stress was estimated by the bending-beam method. With an increase in the C content, the content of the cubic phase in BN:C films was reduced, and the structure of films changed from a cubic phase to a hexagonal phase at more than 13.1 at.% content of the carbon, while the compressive stress of 5.8 GPa and the hardness value of 60 GPa were reduced to 2 GPa and 10 GPa, respectively. Furthermore, the friction coefficient of the films was estimated in dry air, and the BN film with a content of 7.7 at.% carbon showed a lower value of 0.14 compared with 0.17 of the pure-cBN film.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
