Synthesis and measurement of normal incidence X-ray multilayer mirrors optimized for a photon energy of 390 eV

Abstract

The problems inherent in the fabrication of short period multilayer mirrors are discussed and results of the synthesis of multilayer structures with nanometer period are presented. The shortest period observed is 13 Å for WSi and WB 4C sputtered multilayers. Measurements of near normal incidence reflectivity at λ = 31–32Å are presented for WSc multilayers with a period approximately 16 Å. The measured reflectivity reaches a maximum of 3.3% and is in good agreement with theoretical modeling after the inclusion of interfacial roughness.