Abstract
Poly(p-phenylene benzobisoxazole)/poly(pyridobisimidazole) block copolymers (PBO-b-PIPD) were prepared by introducing poly(pyridobisimidazole) (PIPD) moieties into the main chains of poly(p-phenylene benzobisoxazole) (PBO) in order to enhance its photostability. PBO and copolymer fibers were directly prepared from the polymerization solutions by dry-jet wet-spinning. Chemical structures and molecular chains arrangement of the block copolymers were characterized by Fourier transform infrared (FTIR) spectroscopy, solid-state 13C-NMR and wide angle X-ray diffraction (WAXD). Thermal stability of the copolymers was investigated by thermogravimetric analysis (TGA) in nitrogen. Thin films of PBO and copolymers were cast from methanesulfonic acid (MSA) solutions. Both the films and fibers were exposed to UV light to determine their photostability. Changes in the chemical structures and surface morphologies of the films were characterized by FTIR spectra and scanning electronic microscopy (SEM), respectively. After UV light exposure, the retention of strength for copolymer fibers is improved compared to PBO fibers. The results revealed that copolymers suffered less photodegradation in comparison with homopolymer. The mechanism for the improved photostability of the copolymers was discussed.
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