Abstract
In this study ZnO based photocatalyst films were deposited using magnetron sputtering with in-situ control of the physical vapor phase composition. Precise monitoring and control of Zinc, Argon and oxygen content in plasma phase allowed to identify small range of parameters which led to the formation of samples in the intermediate zone between metallic Zn and stoichiometric ZnO. Photocatalytic tests have demonstrated that in such samples metallic zinc up to some extent improves the photocatalytic efficiency of ZnO oxide. The relationship between magnetron sputtering process parameters and film properties are provided and their influence to the photocatalytic activity of the films is discussed.
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