Abstract

A new strategy was proposed for the synthesis of fluorene-containing indole polyphenols, based on the Suzuki–Miyaura reaction of hexabrominated symmetric indole trimer with the monoboryl N,N'-di[9,9'-bis(3',5'-dimethoxybenzyl)fluoren-2'-yl]aniline derivative and subsequent chemical transformations. The prepared compound was applicable for the development of a promising positive resist for electron-beam nanolithography capable of forming patterns with a 12 nm resolution.

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