Abstract

A new strategy has been suggested for the synthesis of sumanene-containing polyphenols chemically bound to a molecular platform based on the triindolyl macrocycle. The initial assembly has been obtained by the Suzuki–Miyaura reaction of a bromo-containing indolyl macrocycle and boryl derivative of N,N'-disumanenylaniline. Subsequent benzylation with 3,5-dimethoxybenzyl bromide, exhaustive demethylation of the modified macrocycle, and partial blocking of the corresponding phenolic hydroxyls by two different acid-labile protective groups have led to the formation of the target polyphenol containing sumanene fragments. The obtained polyphenol has allowed us to develop on its basis a new positive resist for electronbeam nanolithography. This resist can realize topological structures with resolution of 9–12 nm.

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