Abstract
A self-electro-optic effect device (SEED) epistructure grown by low-pressure metalorganic vapor phase epitaxy (MOVPE) is demonstrated. The symmetric SEED using GaAs/Al0.04Ga0.96As shallow quantum well (SQW) exhibits a contrast ratio of 2.9 at 5 V bias with 50 pairs of GaAs wells. This high contrast results from the low background carrier concentration of absorption region which is obtained by the temperature controlled compensation of the acceptors and donors. The absorption data suggest that the MOVPE technique is comparable to the MBE technique in growing the high performance SQW epistructure.
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