Abstract
This paper presents the SYLAM system of hierarchical symbolic layout for IC masks. The system is characterized by the following aspects: i) ease of use at the level of input, manipulation, positioning and visualisation of symbols by use of a highly sophisticated graphical system ii) independance in regard to the technology obtained by a hierarchical structure iii) a high level of adaptability enabling a potential user of the SYLAM system to easily define a particular symbolic language well adapted to his particular needs.
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