Abstract
Fluorite-Structured Materials Recently, ferroelectric and antiferroelectric fluorite-structured materials (HfO2 and ZrO2) have gotten much attention for memory- and energy- related applications because of being suitable for CMOS compatibility and ultra-low deposition thickness. In article 2200403, Faizan Ali, Muhammad Faisal Iqbal, and colleagues discuss the frequency-dependent phase switching and energy storage properties of HfO2-based thin films.
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