Abstract
The dissolution (including the formation of a transient swelling layer) of a resist polymer is key to realizing ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified. In this study, the swelling and dissolution kinetics of poly(4-hydroxystyrene) (PHS) films in tetramethylammonium hydroxide (TMAH) and tetrabutylammonium hydroxide (TBAH) aqueous solutions were investigated by a quartz crystal microbalance method. PHS is a typical backbone polymer (a dissolution agent) of chemically amplified resists. The swelling and dissolution kinetics of PHS were observed by changing the protection ratio of the hydroxyl groups of PHS and the alkaline concentration in developers. Not only the dissolution rate but also the mode of dissolution depended on the molecular structure of tetraalkylammonium cations. For polymer matrices with strong hydrogen bond networks such as PHS, the penetration of tetrabutylammonium cations is considered to be strongly suppressed by their long alkyl chains.
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