Abstract
Micropatterning techniques using vacuum ultra-violet light at 172 nm in wavelength and anultra-violet laser at 244 nm were applied to organosilane self-assembled monolayers(SAMs) formed on Si substrates covered with a 2 nm thick oxide layer. TheseSAMs were prepared from precursors, that is, octadecyltrimethoxysilane (ODS) orp-chloromethylphenyltrimethoxysilane (CMPhS). Polar functional groups such as COOHwere generated through photochemical oxidation of the SAMs. Furthermore, the SAMswere simultaneously etched and finally removed from the photoirradiated area. Surfacepotentials of the photoirradiated areas at various irradiation dose rates were measured byKelvin-probe force microscopy (KFM) using the unirradiated area on each of thephotopatterned samples as a reference. Changes in the surface chemical compositionof the SAMs could be clearly and sensitively measured by KFM through thedifference in surface potential between the irradiated and unirradiated SAMs.
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