Abstract
Recently, excellent surface passivation has been achieved for both p- and n-type silicon solar cells using AlOx/SiNx:H stacks deposited by atomic layer deposition and plasma-enhanced chemical vapor deposition. However, alternative materials and deposition methods could provide practical options for large-scale manufacturing of commercial solar cells. In this study we demonstrate that AlOx/AlNx stacks fabricated by reactive radio-frequency magnetron sputtering can provide fairly good surface passivation (Smax of ∼30 cm/s) regardless of AlOx thickness, which is found to be due to the high negative fixed charge density (Qeff of −2.8 × 1012 cm−2) and moderately low interface trap density (Dit of 2.0 × 1011 eV−1·cm−2). The stacks also show fairly good antireflection performance in the visible and near-infrared spectral region. The demonstrated surface passivation and antireflection performance of in situ reactively sputtered AlOx/AlNx stacks make them a promising candidate for a surface-passivating antireflection coating on silicon solar cells.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.