Abstract
Zinc oxide nanostructures have been obtained by plasma-enhanced chemical vapor deposition technique. High-purity elemental zinc was used as the precursor. RF (40MHz) inductively coupled plasma discharge was used for the initiation of the plasma-chemical reactions in the gas phase. Hydrogen-oxygen (H2-O2) composition of various ratios was used as the source plasma gas mixture. The optical emission spectroscopy was used as the powerful tool to determine the intermediate excited particles and assume the possible mechanism of the plasma-chemical reactions. The paper also investigates the influence of the substrate’s materials, its temperature, and the power of the heat input into the discharge. The properties of the sprayed materials were characterized by the method of atomic force microscopy.
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