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Abstract
Polystyrene was modified by low energy hydrogen ions in ultrahigh vacuum. The modified surfaces were analyzed in situ by x-photoelectron spectroscopy and ex situ by atomic force microscopy. Results revealed that 10 eV H + ion bombardment on polystyrene produces a cross-linked network film, while the polymer backbone remains intact and undesirable impurity (such as nitrogen, oxygen, etc) incorporation is eliminated. The as-prepared network film is just about 5–6 nm thick, but is highly resistant to chemical solvent. However, when 100 eV H + ion bombardment is used, the aromatic rings are seriously damaged and the surface of organic film is etched. This work suggests a new route to the preparation of ultrathin polymer network films.
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