Abstract
A vacuum-UV F2 laser of 157 nm wavelength induced strong oxidation of Fe thin film surface to show the chemical resistance to pseudo seawater and HNO3 aqueous solution for selective metallization on silica glass substrate. The strong oxidation reactions on the surface and in the depth direction were confirmed by X-ray photoelectron spectroscopy. The corrosion resistance of the F2 laser irradiated samples was also supported by an electrochemical test. A fine pattern of the F2 laser irradiated Fe thin film was successfully formed after the HNO3 chemical etching.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
