Fabrication of hydrophobic and corrosion resistant iron thin film by interference exposure using 157nm F2 laser

Abstract

A periodic nanostructure of pure iron thin film deposited on silica glass substrate was, on the average of 14 nm in height and at regular intervals of approximately 500 nm, directly fabricated by the interference exposure using a 157 nm F2 laser. The silica glass surface underneath the F2 laser exposed iron selectively swelled to push up the iron thin film. Simultaneously, the surface of the periodically nanostructured iron was photochemically modified into an extremely thin Fe3O4 during the F2 laser exposure. As a result, the samples revealed successfully hydrophobic property and high corrosion resistance to quasi-seawater.