Surface Functionalization of WO3 Thin Films with (3-Aminopropyl)triethoxysilane and Succinic Anhydride

Abstract

We report effects of oxygen plasma treatment on the surface functionalization of WO3 thin films with (3-aminopropyl)triethoxysilane (APTES) and succinic anhydride (SA). X-ray diffraction and x-ray photoelectron spectroscopy results indicate the existence of the WO3 phase. Fourier transform infrared spectroscopy measurement shows clear bands at 1040 cm−1 (Si–O–Si), 1556 cm−1 (N–H), 1655 cm−1 (C=O), 2937 cm−1 (C–H) and 3298 cm−1 (N–H), confirming the surface functionalization efficiency enhanced by prior treatment of oxygen plasma. It thus follows that the prior oxygen plasma treatment activates hydroxylation with more –OH groups on the WO3 surface, which can pave a highly efficient way to the surface functionalization by APTES and SA.