Abstract
The effect of oxygen (O2) plasma treatment on indium doped tin oxide (ITO) nanorods films prepared by the ion-assisted electron-beam evaporation with the glancing-angle deposition technique (GLAD) were investigated. The ITO nanorods films were plasma treated in oxygen ambient at different O2 flow rates in the range of 20-100 sccm. The physical microstructures have been investigated by grazing-incident X-ray diffraction (GIXRD) and field-emission scanning electron microscopy (FE-SEM). The electrical and optical properties were characterized by four-point probe measurements and UV-VIS-NIR spectrophotometry, respectively. The results showed that all the ITO nanorods films exhibited as bixbite structure. The morphology of as prepared films showed vertically aligned nanocolumnar with diameter of 50-63 nm cause of the shadowing effect and limited adatom diffusion. In addition, the influence of O2 plasma treatment on electrical and anti-reflection with omnidirectional property of ITO nanorods films were systematically evaluated and discussed in this paper.
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