Abstract
A range of the most important problems of fine silica powder surface chemistry are considered in terms of a unified approach based on the analysis of the electronic structure of the surface moieties. The amorphous silica hydroxylic cover topography is analyzed, and the peculiarities of the cover thermal destruction are studied. Different forms of adsorbed water have been identified, and characteristic properties of the hydrated film structure have been ascertained. The dehydration and dehydroxylation process mechanisms have been suggested. General regularities of different compound adsorption have been established, which are caused by the sterical compatibility of adsorbates and silica surface structural elements. Various aspects of the reagent structure deformation during elementary chemical transformations in the surface layer have been considered. Simple methods of estimation for chemical reaction activation barriers have been developed, which are of great importance for the silica surface modification processes.
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