Abstract
A coating experiment of a TiB 2 compound on a polycrystalline Mo substrate has been carried out using the magnetron sputter method. The substrate surface must be carefully prepared in order to obtain a defect-free coating with good adhesion properties. This has been found by ISS, AES, and SEM analysis of the TiB 2 coating. The surface composition of the TiB 2 coating, as determined by AES, is the same as that of the hot pressed TiB 2 cathode rod. The sputtering yields of the films for an Ar + ion of 1 keV are measured by the weight-loss method, and the average value obtained is 0.56 atoms/ion.
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