Abstract
The influence of low-pressure and low-temperature hydrogen plasma on a pure molybdenum sample implanted with caesium is investigated by means of sputtering-XPS. A portion of the sample was exposed to the plasma, while the rest of the sample was covered by stainless steel and thus shielded from direct plasma flux. The results show that the part of the sample exposed to the plasma exhibits both on and beneath the surface an increased amount of H2O and MoO2 with respect to the covered sample part which can be explained by a chemical reduction of MoO3 oxides by the hydrogen plasma species. The XPS Cs lines show oxidation peaks. A sputtering depth of roughly 13 nm is necessary to recover an identical spectrum, indicating that the plasma changes the chemical composition of the implanted samples not only on the surface but also inside the material.
Published Version
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