Abstract
In this work, we investigate in details the air/film and film/substrate interface morphology of single HfO 2, SiO 2 and ZrO 2 films by means of X-ray reflectivity and atomic force microscopy measurements. The films were deposited on silicon substrate by dual ion beam sputtering technique. The roughness obtained from the X-ray scattering experiments were compared with the atomic force microscopy data.
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