Suppression of tunneling leakage current in junctionless nanowire transistors

Abstract

In this paper, the characteristics of tunneling leakage current for the dual-material gate junctionless nanowire transistor (DMG-JNT) are investigated by three-dimensional numerical simulations and compared with conventional junctionless nanowire transistor (JNT). The suppression of the tunneling leakage current on the JNT by introducing an energy band step with the DMG structure is verified and presented for the first time. The effects of channel length on the DMG-JNT and the JNT are also studied. Results showed that the tunneling leakage current of the DMG-JNT is two orders smaller than that of the JNT, and further, the DMG-JNT exhibits superior scaling capability. Two key design parameters of the DMG-JNT, control gate ratio (Ra) and work function difference (δW), have been optimized and the optimal ranges of Ra and δW are pointed out.