Abstract
In this work, based on the advanced drift and diffusion model with commercial software, the Crosslight APSYS, twodimensional photoresponsivity behavior for the InP/InGaAs separate absorption, grading, charge and multiplication avalanche photodiodes have been modeled to analyze suppressing premature edge breakdown. Basic physical quantities like band diagram, photon absorption, carrier generation and electric field as well as performance characteristics such as photocurrent, multiplication gain, and breakdown voltage etc., are obtained and selectively presented. Modeling results indicate that an etched mesa structure with the charge sheet layer can effectively suppress the premature edge breakdown in the device periphery region. Optimization modeling results with mesa step height are also demonstrated. Approach to model complex guard ring structure with double diffusion is further explored. Possible combination of Crosslight CSuprem diffusion profile is also discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
