Abstract
In this article we obtained a superhydrophobic patterned Ag film mainly by two steps. The first step is to fabricate a DNA film pattern through poly(dimethyldiallylammonium chloride) alternate deposition with DNA on a latent imaging film formed by the selective UV exposure of a photosensitive diazoresin/poly(acrylic acid) self-assembly (SA) film. The second step is to build up the patterned Ag film on a DNA film pattern with Ag electroless deposition. After surface modification with n-dodecanethiol the patterned Ag film, which exhibits obvious microstructures and nanostructures, will possess superhydrophobic properties and the contact angle can reach ∼162°.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
