Abstract
To fabricate any cyroelectronic device based on the superconducting NbN film elements, one must carry out a number of technological processes, including several stages of superconducting material deposition on hot substrates, ion etching, and ion implantation. Changes in the superconducting properties of different NbN films after the ion implantation were investigated earlier.1 It was found that the ion implantation can cause sharp changes of Tc and hence can be applied as a method to determine the local characteristics of NbN films. Influences of heat treatment and ion etching on properties of NbN superconducting films are assumed to be unfavourable. So, the main purpose of this work is to study the changes of NbN film properties under different kinds of treatment and to determine how to form the initial film structure that will prevent their deterioration.
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