Abstract
Laser thermal lithography has been proposed for a few years, which has the advantages of breaking through the optical diffraction limit, operation in far-field and in air, and low production cost. In this paper, a new hydrazone metal complex is used as the laser thermal lithography material due to its feature of the one-step fabrication of micro/nano structure without mask and wet-etching process. Based on the laser thermal lithography method, super resolution nano-information pits are directly written on the surface of hydrazone metal complex thin films. Pits with a minimum feature size of about 79 nm are successfully obtained, which is only about 1/7 of the writing spot size. Moreover, the reactive ion etching method can be applied to transfer the pits onto a silica substrate. These results suggest the potential applications of the new material in high density optical data storage and semiconductor industries.
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