Abstract
Hydrogenated carbon films were grown by a plasma-enhanced chemical vapor deposition (PECVD) techniqueusing CH4 and H2 as feedstock at ambient temperature. The microstructure of the films was characterized byhigh resolution transmission electron microscopy (HRTEM). The images showed thepresence of curved basal planes in fullerene-like arrangements. An apparent amorphousgraphene structure with nm-sized packages of basal planes in a turbostratic feature wasobserved. The fabricated fullerene-like hydrogenated carbon films (FL–C:H) possesssuperior mechanical properties, i.e. high hardness (19 GPa) and high elasticity(elastic recovery of 85%). More importantly, the films exhibit ultra-low friction(μ = 0.009) under ambient conditions with 20% relative humidity.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
