Abstract
The use of super-junction (SJ) techniques in PIN photodiodes is proposed in this letter for the first time with the objective to assist the optoelectronic integrated circuits (OEICs) implementation in complementary metal oxide semiconductor (CMOS), bipolar CMOS (BiCMOS) and bipolar-CMOS-double diffused MOS (BCD) technologies. Its technological viability is also discussed to make it credible as an alternative to other OEICs approaches. Numerical simulation of realistic SJ-PIN devices, widely used in high power electronics, demonstrates the possibility to integrate high-performance CMOS-based OEICs in epitaxial layers with doping concentrations above 1×1015 cm-3. The induced lateral depletion at low reverse biased voltage, assisted by the alternated N and P-doped pillars, allows high-speed transient response in SJ-PIN detecting wavelengths between 400 and 800 nm. Moreover, other important parameters as the responsivity and the dark current are not degraded in respect to the conventional PIN (C-PIN) structures.
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