Abstract

The super junction has been the most important concept for the design of power devices. However, there are still two problems when the conventional super-junction techniques are applied on lateral power devices: a large portion of the drift region is occupied by a p-type region, and the super junction techniques are not suitable for the gallium nitride-based high electron mobility transistor (GaN-HEMT). To solve the problems, a super field plate (SuFP) technique is proposed as a charge balance principle. Our analyses proved that the SuFP can provide a charge balance effect for a lateral double diffused MOS (LDMOS) without occupying the drift region. As a result, the LDMOS with SuFP has a better performance than the LDMOS with other charge balance realization techniques. Moreover, as a kind of field plate, the SuFP is also suitable for GaN-HEMT. Thereby, the proposed SuFP technique overcomes the two problems in conventional super-junction techniques and is significant for lateral power devices.

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