Abstract
A closed-surface silica antireflection thin film was prepared in single dipping process by growing branched silica chain from modified acid catalyzed sol-gel in hollow silica sphere sol-gel. The refractive index and thickness of thin film could be fine-tuned via acid catalyzed sol-gel content and withdrawing speed. Transmittance of this closed-surface AR thin film was as high as 97.1% with refractive index around 1.25–1.27. 2.5% gain in short circuit current was measured from both external quantum efficiency and flashing test on mini photovoltaic modules. The closed-surface structure was with a 5H pencil hardness, and approximately 2.0GPa indent hardness in nanoindenter test. It was resistant to high moisture and high temperature, mainly due to absence of voids on surface. The closed-surface AR thin film had potential to be applied in photovoltaic module, architecture windows in severe climate conditions.
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