Abstract
High photo-resistance and photo-sensitivity is a persistent challenge in photopolymerization. In this research, sunlight stability of commercial photoinitiator camphorquinone (CQ) based photo-curing materials is enhanced by adding the mixture of (E)-1-(cyclohex-1-en-1-yl)-3-(1H-pyrrol-2-yl)prop-2-en-1-one (E-CHPO) and its cis isomer Z-CHPO used as a solution mask. These compounds have a broad absorption range and a high molar extinction coefficient, ranging from 250 nm to 550 nm, which inhibits the action of CQ. Furthermore, CQ could also absorb light for polymerization as E/Z-CHPO gradually fades due to its [2 + 2] cycloaddition reaction under LED@465 nm irradiation with high light intensity. Additionally, corresponding mechanism was investigated.
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