Abstract

Chalcogen vacancy has long been recognized as a detrimental deep‐level defect that can induce severe charge recombination and diminish the quasi‐Fermi‐level splitting in Sb2S3 and Sb2Se3, especially when they are prepared by physical vapor deposition in vacuum. In order to counter this limitation, a sulfur‐supplemented vapor transport deposition technique is proposed, which intentionally introduces low pressure sulfur vapor and can thus afford low‐defect‐density antimony chalcogenide films. The resultant photocathodes modified with conformal TiO2 protection layer and Pt cocatalyst demonstrate a photocurrent as high as 20 mA cm−2 along with a much improved fill factor and onset potential, achieving an applied bias photoconversion efficiency above 1%. This work highlights the importance of the vacancy defect passivation and the preferential crystalline orientation in the film in promoting the photocathode performance.

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