Abstract
This chapter discusses vacuum evaporation and vacuum deposition. Vacuum deposition (or vacuum evaporation), is a physical vapor deposition (PVD) process in which the atoms or the molecules from a thermal vaporization source reach the substrate without collisions with residual gas molecules in the deposition chamber. This type of PVD process requires a relatively good vacuum. The saturation or equilibrium vapor pressure of a material is defined as the vapor pressure of the material in equilibrium with the solid or liquid surface in a closed container. At equilibrium, many atoms return to the surface to leave the surface. Vapor pressure is measured by the use of a Knudsen cell, which consists of a closed volume with a small orifice of known conductance.
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