Substrate with Si Nanoparticles Prepared by Low Pressure Chemical Vapor Deposition for Application in Si Solar Cells

Abstract

Nanostructure strategies are frequently used to enhance the light absorption in solar cells. For improving the efficiency of absorption in solar cells, an industrial-feasible processing technique, i.e. low-pressure chemical vapor deposition was used to form a substrate with large-area silicon nanoparticles (Si-NPs). It was shown that the density and size of Si-NPs can be modulated by controlling the flow of pure SiH4, the deposition temperature and the deposition time. The substrate with large-area Si-NPs can be applied in photovoltaic devices since they can increase the effective absorption path of the incident sunlight.