Abstract
Abstract The structural, electrical and optical property of nickel oxide thin films deposited by electron beam physical vapour deposition were investigated with respect to substrate temperature (Ts = 100, 300, and 450 °C). In spite of the amorphous nature of the substrate (quartz), depending on the substrate temperature either a preferred or polycrystalline NiO growth was observed. A (200) preferential orientation resulted at 100 °C while at 300 and 450 °C the NiO films were oriented along (111) and (220) planes. The NiO films obtained at Ts = 100 °C was highly transparent compared to the polycrystalline films due to the low light scattering of (200) film. The conductivity of NiO films measured at 100 °C was found to be three orders higher than the films obtained at Ts = 450 °C. Thus, the orientation was found to be influencing optical and electrical properties of NiO films.
Published Version
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