Substrate conformal imprint lithography: functional resists, overlay performance, and volume production results

Abstract

We will introduce SCIL as a full-wafer soft-stamp base nanoimprint technique with the advantages of being able to replicate sub-10nm features and perform micron accurate overlay alignment over 200mm wafers. The combination of PDMS based soft stamps and an inorganic crosslinking imprint resist leads to a very long stamp lifetime and the direct patterning of complex deep sub-micron patterns, such as slanted gratings with an index up to n=2.1. These complex patterns are of high interest for nano-photonic enabled applications such AR/VR and metasurfaces with applications such as “perfect” flat lenses. A new analytical model based on hyper-elastic deformation of silicon rubber nano-patterns was developed and is able to accurately predict pattern stability from sub-micron to less than 20nm patterns.