Wafer scale direct nanoimprinted high index inorganic (slanted) gratings for AR

Abstract

Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel silicone rubber stamp. SCIL showed direct replication of sub-50nm patterns in silica over 200mm wafers with stamp lifetimes over 500 imprints, for AR, NIL resist with an index of up to n=1.96 and overcoat layers of up to n=2.1. Replication of slanted grating patterns in multiple orientations over the wafer are possible. First results of full 300mm wafer imprints will be shared.