Abstract
Thin films of poly(methyl methacrylate) (PMMA) (25 nm) deposited on gold coated glass substrates have been locally modified by exposure to biased atomic force microscopy (AFM) tips. Constant exposure currents in the range of 0.5–0.65 nA leads to removal of PMMA both by direct ablation and enhanced solubility in a developer solution. Possible mechanisms causing such modifications have been discussed. Submicron Au structures were formed by combining AFM lithography, involving localized removal of PMMA, with sputter deposition of gold and a lift-off process.
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