Atomic force microscope lithography in perovskite manganite La0.8Ba0.2MnO3 films

Abstract

Atomic force microscopy (AFM) lithography has been investigated in La0.8Ba0.2MnO3 (LBMO) films. Unexpectedly, AFM lithography can be performed in LBMO film not only under a positive sample bias, but also under a negative sample bias. Under a positive sample bias voltage, grooves can be obtained directly with poor controllability and reproducibility. However, under a negative sample bias, controllable nanosized patterns were obtained with excellent reproducibility and a high etching selectivity. It is expected that various nanodevices will be fabricated by AFM lithography and etching techniques with perovskite manganites.