Abstract
We describe a fabrication process for and the characterization of submicrometer-thick As <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> S <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> waveguides. Poly(methylmethacrylate) and bottom antireflective coating were employed as thin protective layers prior to photoresist patterning in order to prevent the attack of the As <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> S <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> film by an alkaline developer. Propagation losses of ~0.2 and 0.6 dB/cm were measured for 4- and 2-¿m-wide waveguides fabricated from 0.85-¿m-thick films. Slightly higher loss in the transverse-magnetic mode may be the result of surface scattering of the rougher etched sidewalls.
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